Company Filing History:
Years Active: 2007-2008
Title: Malcolm W Robertson: Innovator in Polishing Pad Technology
Introduction
Malcolm W Robertson is a notable inventor based in Aston, PA (US). He has made significant contributions to the field of chemical mechanical polishing pads, holding 2 patents that showcase his innovative approach to improving manufacturing processes.
Latest Patents
Robertson's latest patents include a method and apparatus for forming a polishing pad with reduced striations. The method involves creating a chemical mechanical polishing pad by utilizing a tank filled with polymeric materials and a storage hopper containing microspheres. This process includes fluidizing the microspheres to reduce their initial bulk density, followed by mixing them with polymeric materials to create a molded product. The apparatus complements this method by providing a delivery system that ensures the efficient mixing of materials, ultimately leading to the production of high-quality polishing pads.
Career Highlights
Robertson has been associated with Rohm and Haas Electronic Materials Cmp Holdings, Inc., where he has applied his expertise in materials science to develop innovative solutions for the electronics industry. His work has significantly impacted the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.
Collaborations
Some of his notable coworkers include Joseph P Koetas and Alan E Leviton, who have collaborated with Robertson on various projects, contributing to advancements in polishing pad technology.
Conclusion
Malcolm W Robertson's contributions to the field of polishing pad technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials and processes that enhance manufacturing efficiency.