Honeoye Falls, NY, United States of America

Malcolm Muir

This inventor holds 9 USPTO granted patents, plus 3 CIPO patents and 4 EPO patents. Top assignees: Advantage Manufacturing Corporation, Caldwell Manufacturing Company North America, LLC. Active years: 1999-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Malcolm Muir. Retrieved from https://idiyas.com/inventor/malcolm-muir

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


 

Average Co-Inventor Count = 1.3

ph-index = 5

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 1999-2020

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9 patents (USPTO):Explore Patents

Title: The Innovative Journey of Malcolm Muir

Introduction: Malcolm Muir, a distinguished inventor hailing from Honeoye Falls, NY (US), has made significant contributions to the field of innovations with his groundbreaking ideas and inventions.

Latest Patents: Malcolm Muir holds several patents in various industries, including technology, healthcare, and consumer goods. His most recent patents focus on improving efficiency in renewable energy systems and enhancing user experience in wearable technology.

Career Highlights: With a career spanning over two decades, Malcolm Muir has established himself as a visionary inventor known for his ability to transform complex ideas into practical solutions. He has worked with leading companies to develop cutting-edge products that have revolutionized their respective markets.

Collaborations: Throughout his career, Malcolm Muir has collaborated with top researchers, engineers, and designers to bring his inventions to life. His collaborative approach has led to the successful commercialization of several innovative products that have had a lasting impact on society.

Conclusion: Malcolm Muir's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a pioneering inventor. His dedication to pushing the boundaries of what is possible continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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