Funabashi, Japan

Makoto Senoue


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 1986-1987

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2 patents (USPTO):Explore Patents

Title: The Innovations of Makoto Senoue

Introduction

Makoto Senoue is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of waste gas treatment and semiconductor processing. With a total of 2 patents, his work reflects a commitment to advancing technology in these areas.

Latest Patents

Senoue's latest patents include a method for treating waste gas and a dry-etching process. The method for treating waste gas involves contacting the waste gas containing a fluorine component and/or a chlorine component with magnesium oxide particles that have a specific surface area of 100 to 200 m²/g. The dry-etching process comprises the dry-etching treatment of semiconductor material by the action of a gas, and if necessary, a cleaning treatment. This process is characterized by conducting at least one of the dry-etching and cleaning treatments under the action of a gas composed essentially of a fluorinated ether.

Career Highlights

Throughout his career, Senoue has worked with prominent companies such as Asahi Glass Company, Limited and Kokusai Electric Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques.

Collaborations

Some of his notable coworkers include Kunihiko Terase and Shinya Iida. Their collaboration has likely contributed to the advancements in the technologies they have worked on together.

Conclusion

Makoto Senoue's contributions to waste gas treatment and semiconductor processing highlight his innovative spirit and dedication to technological advancement. His patents and collaborations reflect a significant impact on the industry.

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