The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1986
Filed:
Oct. 04, 1984
Applicant:
Inventors:
Makoto Senoue, Funabashi, JP;
Kunihiko Terase, Tokyo, JP;
Shinya Iida, Hamura, JP;
Hideo Komatsu, Hamura, JP;
Assignees:
Asahi Glass Company Ltd., Tokyo, JP;
Kokusai Electric Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 134-1 ; 156646 ; 156656 ; 156657 ; 1566591 ; 156662 ; 156664 ; 156665 ; 2041 / ; 252 791 ; 427 38 ;
Abstract
A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.