Shunan, Japan

Makoto Sato

This inventor holds 2 USPTO granted patents. Top assignee: Tokuyama Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Sato. Retrieved from https://idiyas.com/inventor/makoto-sato-kogtb7aa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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2 patents (USPTO):Explore Patents

Title: Makoto Sato: Innovator in Inorganic Oxide Particle Production

Introduction

Makoto Sato is a distinguished inventor based in Shunan, Japan. He has made significant contributions to the field of materials science, particularly in the production of inorganic oxide particles. With a total of 2 patents to his name, Sato's work is recognized for its innovation and practical applications.

Latest Patents

Sato's latest patents focus on a method for producing inorganic oxide particles. The invention outlines a process that includes several steps to achieve high purity and excellent flowability of the inorganic oxide particles. This method is crucial for various industrial applications, enhancing the quality and performance of materials used in different sectors.

Career Highlights

Makoto Sato is currently associated with Tokuyama Corporation, where he continues to advance his research and development efforts. His work has not only contributed to the company's success but has also positioned him as a key figure in the field of inorganic materials.

Collaborations

Sato has collaborated with notable colleagues, including Takayuki Maehara and Tadaharu Komatsubara. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Makoto Sato's contributions to the production of inorganic oxide particles exemplify the impact of innovative thinking in materials science. His patents reflect a commitment to quality and advancement in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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