Kyoto, Japan

Makoto Otsuka

USPTO Granted Patents = 2 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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2 patents (USPTO):Explore Patents

Title: The Innovations of Makoto Otsuka

Introduction

Makoto Otsuka is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of tea aroma compositions, holding two patents that showcase his innovative spirit. His work focuses on enhancing the sensory experience of tea through unique aromatic compositions.

Latest Patents

Otsuka's latest patents include a "Tea aromatizing composition having floral aroma." This invention aims to provide an aromatizing material with an excellent floral aroma. The composition includes linalool, geraniol, and 2-methylbutanal, with a specific weight ratio of 2-methylbutanal content to the total linalool and geraniol content adjusted to be in the range of 0.010 to 0.215. Another significant patent is the "Method for manufacturing tea aroma composition," which enhances the excellent aroma of tea leaves. In this method, tea leaves are treated by steam distillation to collect a distillate, which is then subjected to distillative concentration.

Career Highlights

Makoto Otsuka is associated with Suntory Holdings Limited, a company renowned for its commitment to quality and innovation in the beverage industry. His work at Suntory has allowed him to explore and develop new methods for enhancing tea aromas, contributing to the company's reputation for excellence.

Collaborations

Otsuka has collaborated with notable coworkers such as Daisaku Yonezawa and Takashi Mukai. These collaborations have likely fostered a creative environment that encourages the development of innovative solutions in the field of tea aroma.

Conclusion

Makoto Otsuka's contributions to the field of tea aroma compositions reflect his dedication to innovation and quality. His patents not only enhance the sensory experience of tea but also demonstrate the potential for further advancements in this area.

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