This inventor holds 3 USPTO granted patents. Top assignee: Nec Corporation. Active years: 1994-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994-2004
Title: Makoto Omiya: Innovator in Thin Film Technology
Introduction
Makoto Omiya is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thin film technology, holding three patents that showcase his innovative approach to equipment and methods in this area.
Latest Patents
Omiya's latest patents focus on thin film forming equipment and methods. These inventions are designed to produce high-quality thin films while effectively preventing CVD material gas from leaking into the surroundings at a low cost. The thin film equipment includes a substrate, a substrate holding device, and a mechanism for providing atmospheric gas to the substrate's surface. Notably, the upper face of the substrate and the upper face of the substrate holding device are almost on one plane, enhancing the efficiency of the process.
Career Highlights
Makoto Omiya is currently employed at NEC Corporation, where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the advancement of thin film technology.
Collaborations
Omiya collaborates with notable coworkers, including Yukio Morishige and Katsuya Tomiyama. Their combined expertise contributes to the success of their projects and the development of cutting-edge technologies.
Conclusion
Makoto Omiya's contributions to thin film technology through his patents and work at NEC Corporation highlight his role as an influential inventor in the field. His innovative solutions continue to push the boundaries of what is possible in thin film applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile