Mitaka, Japan

Makoto Ogawa

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Ogawa. Retrieved from https://idiyas.com/inventor/makoto-ogawa-44wc77ql

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Makoto Ogawa: Innovator in Transparent Bulk Silica Porous Materials

Introduction

Makoto Ogawa is a distinguished inventor based in Mitaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of transparent bulk silica porous materials. His innovative work has implications for various optical and electronic applications.

Latest Patents

Ogawa holds a patent for a transparent bulk silica porous material with a uniform pore size. The method for producing this material is noteworthy, as it results in a product with a large crystal size that effectively reduces light scattering. The uniform and adjustable pore size enhances its utility for optical and electronic functional materials.

Career Highlights

Ogawa is associated with Kabushiki Kaisha Toyota Chuo Kenkyusho, where he has been instrumental in advancing research and development in his field. His work has garnered attention for its potential applications in various industries.

Collaborations

Ogawa has collaborated with notable colleagues, including Noriaki Sugimoto and Shinji Inagaki. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Makoto Ogawa's contributions to the field of transparent bulk silica porous materials highlight his role as a leading inventor. His innovative methods and collaborative efforts continue to influence advancements in optical and electronic materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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