Company Filing History:
Years Active: 2018
Title: **Makoto Katsurayama: Innovator in Photosensitive Resin Technologies**
Introduction
Makoto Katsurayama is a distinguished inventor based in Tokyo, Japan, renowned for his contributions to the field of photosensitive resin compositions. With a focus on creating advanced materials for various applications, Katsurayama's work has significant implications in the technology and manufacturing sectors.
Latest Patents
Katsurayama holds a patent for a novel photosensitive resin composition and methods related to forming resist patterns and producing metallic patterns. This invention provides a comprehensive resin formulation that includes an alkali-soluble resin, a compound with ethylenically unsaturated double bonds, and a photo radical polymerization initiator featuring an oxime ester structure. The precise formulation and ratios offer enhanced performance in various technological applications.
Career Highlights
Currently, Makoto Katsurayama is affiliated with JSR Corporation, a prominent player in the materials industry. His career includes significant achievements in developing materials that meet the evolving needs of modern technology. His focus on innovation has earned him respect in the field, contributing to advancements in photopolymers and related technologies.
Collaborations
Throughout his career, Katsurayama has collaborated with fellow inventors, including Hisanori Akimaru and Takeshi Watanabe. These partnerships have played a vital role in enhancing the scope and impact of his innovative work, allowing for a blend of ideas and expertise that fosters groundbreaking inventions.
Conclusion
In summary, Makoto Katsurayama's innovative spirit and dedication to advancing photosensitive resin technologies have made him a noteworthy figure in the realm of inventions. His contributions reflect the importance of collaboration and expertise in driving the future of technology and materials science.