Kawasaki, Japan

Maki Murazumi

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maki Murazumi. Retrieved from https://idiyas.com/inventor/maki-murazumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Maki Murazumi: Innovator in Semiconductor Manufacturing

Introduction

Maki Murazumi is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of semiconductor manufacturing. Her innovative work has led to the development of a patented method that enhances the production of semiconductor substrates.

Latest Patents

Maki holds a patent for a "Method of and apparatus for manufacturing a semiconductor substrate." This patent showcases her expertise and commitment to advancing technology in the semiconductor industry. She has successfully secured 1 patent that reflects her innovative approach.

Career Highlights

Maki is currently employed at Fujitsu Corporation, a leading technology company known for its advancements in information technology and electronics. Her role at Fujitsu allows her to apply her inventive skills in a collaborative environment, contributing to the company's success in the semiconductor sector.

Collaborations

Throughout her career, Maki has worked alongside talented individuals such as Yoshihiro Arimoto and Atsushi Fukuroda. These collaborations have fostered a creative atmosphere that encourages innovation and the sharing of ideas.

Conclusion

Maki Murazumi is a trailblazer in the semiconductor manufacturing field, with a notable patent and a strong career at Fujitsu Corporation. Her contributions continue to shape the future of technology in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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