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Years Active: 2016-2025
Title: Maki Kimura: Innovator in Pattern Evaluation Technology
Introduction
Maki Kimura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern evaluation technology. His innovative work has led to the development of a unique patent that enhances the accuracy of overlay position evaluations.
Latest Patents
Maki Kimura holds a patent for a "Pattern Evaluation Method and Pattern Evaluation Device." This method includes several steps, such as estimating imaging deviation to evaluate an overlay position on one or more evaluation point candidates based on pattern layout information. It also involves deciding on evaluation points from the candidates based on the allowed imaging deviation, determining an imaging sequence for the selected evaluation point, and evaluating the overlay position between first and second patterns based on images obtained through this process. He has 1 patent to his name.
Career Highlights
Maki Kimura is currently employed at Hitachi High-Technologies Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of pattern evaluation methods in various applications.
Collaborations
Maki collaborates with talented individuals such as Atsushi Miyamoto and Mayuka Osaki, who contribute to the innovative environment at Hitachi High-Technologies Corporation.
Conclusion
Maki Kimura's contributions to pattern evaluation technology exemplify the impact of innovative thinking in the field. His patent and ongoing work continue to influence advancements in this area.