Tokyo, Japan

Maki Hatae

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Vantara Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maki Hatae. Retrieved from https://idiyas.com/inventor/maki-hatae

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Maki Hatae: Inventor Advancing Storage Migration Management

Introduction

Maki Hatae is an inventor based in Tokyo, Japan, associated with Hitachi Vantara Corporation. Her patent work addresses how organizations can plan the migration of storage configurations from on-premises systems to cloud environments.

Latest Patents

Hatae is named on 1 patent: “Management System and Management Method for Supporting Storage Migration.” The invention maps an on-premises configuration policy to a corresponding cloud configuration policy in advance. A management system analyzes configuration information from the on-premises storage, identifies the matching policy and its cloud counterpart, and provides the user with a configuration plan based on that cloud policy. This approach is designed to support a more structured transition between storage environments.

Career Highlights

Hatae’s listed patent is associated with Hitachi Vantara Corporation. It reflects work on storage management and the practical challenges of translating existing on-premises configurations into cloud-ready plans.

Collaborations

The patent identifies Hatae’s work in connection with Hitachi Vantara Corporation. The provided information does not specify additional inventors or collaborators.

Conclusion

Maki Hatae’s patent focuses on mapping on-premises storage policies to cloud configurations, helping users plan storage migration through a system-generated configuration plan.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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