Ruckersdorf, Germany

Maik Lange

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Alcon, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maik Lange. Retrieved from https://idiyas.com/inventor/maik-lange-e2zl290m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Maik Lange: Innovator in Ophthalmic Imaging Technology

Introduction

Maik Lange is a notable inventor based in Ruckersdorf, Germany. He has made significant contributions to the field of ophthalmic imaging systems. His innovative work focuses on enhancing the accuracy and effectiveness of imaging techniques used in eye care.

Latest Patents

Maik Lange holds a patent for a system designed to correct images for an ophthalmic imaging system. This invention involves a camera system that captures image portions of the eye region. The system includes a computer that processes these images to identify and correct target pixels, ensuring high-quality imaging of the eye.

Career Highlights

Lange is currently employed at Alcon, Inc., a leading company in eye care products and services. His work at Alcon has allowed him to apply his expertise in developing advanced imaging technologies that benefit both practitioners and patients.

Collaborations

One of his notable coworkers is Mario Abraham, with whom he collaborates on various projects within the company. Their combined efforts contribute to the ongoing innovation in ophthalmic imaging.

Conclusion

Maik Lange's contributions to ophthalmic imaging technology exemplify the impact of innovation in healthcare. His patent and work at Alcon, Inc. highlight the importance of advancements in medical imaging for improving patient outcomes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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