This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Nippon Kayaku Kabushiki Kaisha. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Mai Tsubamoto: Patent Inventor in Photosensitive Resin Technology.
Introduction
Mai Tsubamoto is an inventor based in Tokyo, Japan, associated with Nippon Kayaku Kabushiki Kaisha. His patent work concerns photosensitive resin compositions and materials made from them.
Latest Patents
The provided information lists one patent for Tsubamoto: “Photosensitive Resin Composition, Cured Product Thereof and Multilayer Material.” The invention describes a resin composition containing a maleimide compound derived from a diamine and maleic anhydride, alongside a reactive polycarboxylic acid resin. The resin is formed through reactions involving an epoxy resin, a compound with polymerizable ethylenically unsaturated and carboxy groups, and a polybasic acid anhydride. The patent also addresses the cured product and multilayer material made using the composition. Tsubamoto is credited with 1 patent.
Career Highlights
Tsubamoto’s listed patent connects his work with Nippon Kayaku Kabushiki Kaisha and focuses on resin chemistry and materials engineering. The disclosed composition combines reactive components intended for use in photosensitive materials and multilayer structures.
Collaborations
The provided information names Kengo Nishimura and Takahumi Mizuguchi as Tsubamoto’s coworkers. It does not specify their roles in the patent or describe particular collaborations.
Conclusion
Mai Tsubamoto’s listed patent reflects his contribution to photosensitive resin technology through a composition designed for cured products and multilayer materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile