Company Filing History:
Years Active: 2004-2005
Title: Mahn-Ho Cho: Innovator in Metal Gate Electrode Technology
Introduction
Mahn-Ho Cho is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming metal gate electrodes. With a total of 2 patents to his name, his work has implications for improving the performance and reliability of electronic devices.
Latest Patents
Mahn-Ho Cho's latest patents include innovative methods for forming metal gate electrodes. The first patent, titled "Method of forming a metal gate," describes a process where an annealing treatment is conducted in a hydrogen-containing gas environment after a selective oxidation process. This method effectively removes a metal oxide layer formed during oxidation, thereby suppressing whisker nucleation and enhancing surface mobility. The second patent, "Method of forming a metal gate electrode," outlines a technique that prevents whisker formation on metal gate electrodes. This is achieved by creating a metal gate electrode pattern consisting of a polysilicon layer and a metal layer, followed by a selective oxidation process in a nitrogen-containing gas environment. This approach minimizes the formation of a metal oxide layer, thus preventing whiskers on the metal layer.
Career Highlights
Mahn-Ho Cho is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor technologies. His work is crucial in addressing challenges faced in the manufacturing of electronic components, particularly in enhancing the reliability of metal gate electrodes.
Collaborations
Mahn-Ho Cho has collaborated with notable colleagues, including Ja-Hum Ku and Chul-Joon Choi. Their combined expertise contributes to the innovative advancements in semiconductor technology.
Conclusion
Mahn-Ho Cho's contributions to the field of semiconductor technology through his patents on metal gate electrode formation highlight his role as an influential inventor. His work not only addresses current challenges but also paves the way for future innovations in electronic devices.