This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Mahmoud M Khofasteh: Innovator in Chemically Amplified Photoresists
Introduction
Mahmoud M Khofasteh is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of chemically amplified photoresists, particularly through his innovative patent. His work is recognized for enhancing the performance and longevity of photoresist compositions used in various industrial applications.
Latest Patents
Khofasteh holds a patent for "Acid Scavengers for use in chemically amplified photoresists." This invention utilizes proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives effectively scavenge free acids from the photoresist, preserving the acid-labile moieties on the modified PHS polymer. These additives are designed to be compatible with industrial processing conditions and do not react with photoacid compounds, thus preventing the formation of byproducts that could impair photoresist performance. Additionally, the proton sponge and berberine base additives possess different absorption spectra than the modified PHS polymer, allowing for easy assay and control of the additive quantity within the photoresist.
Career Highlights
Khofasteh is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative solutions in the field of photoresists. His expertise and contributions have positioned him as a valuable asset within the company.
Collaborations
Some of his notable coworkers include Nageshwer Rao Bantu and William R Brunsvold. Their collaborative efforts contribute to the advancement of technology in their respective fields.
Conclusion
Mahmoud M Khofasteh is a distinguished inventor whose work in chemically amplified photoresists has made a significant impact on the industry. His innovative patent demonstrates his commitment to enhancing the performance and shelf-life of photoresist compositions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile