This inventor holds 1 USPTO granted patent. Top assignees: University of California, University of Southern California. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2020
Title: Mahesh Neupane: Innovator in Transition Metal Dichalcogenides
Introduction
Mahesh Neupane is a prominent inventor based in Riverside, California. He has made significant contributions to the field of materials science, particularly in the development of transition metal dichalcogenides (TMDCs). His innovative work has the potential to impact various optoelectronic applications.
Latest Patents
Neupane holds a patent for "Bulk direct gap MoS2 by plasma induced layer decoupling." This invention focuses on increasing the interlayer separation of bulk direct TMDCs, such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe). The method involves exposing bulk direct TMDC to a remote oxygen plasma, which enhances photoluminescence efficiency and charge neutral doping. This advancement could lead to improved performance in devices like LEDs, solid-state lasers, photodetectors, solar cells, and thermoelectric generators.
Career Highlights
Throughout his career, Mahesh Neupane has worked at esteemed institutions, including the University of Southern California and the University of California. His research has focused on the properties and applications of TMDCs, contributing to the advancement of optoelectronic technologies.
Collaborations
Neupane has collaborated with notable colleagues, including Rohan Dhall and Stephen B Cronin. These partnerships have fostered a collaborative environment that enhances research and innovation in the field of materials science.
Conclusion
Mahesh Neupane's work in the field of transition metal dichalcogenides represents a significant advancement in materials science. His innovative patent and collaborations highlight his commitment to enhancing optoelectronic applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile