Mahalingam Venkatesan

Title: Mahalingam Venkatesan: Innovator in Thin Film Transistor Technology

Introduction

Mahalingam Venkatesan is a notable inventor based in Mohegan Lake, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of thin film transistors. His innovative methods have paved the way for advancements in electronic devices.

Latest Patents

Venkatesan holds a patent for a "Method for the fabrication of low leakage polysilicon thin film." This patent describes a process for manufacturing a thin film transistor that minimizes leakage current. The method involves several steps, including the deposition of silicon oxide on a semiconductor substrate, the application of a polysilicon layer, and the annealing of this layer in a nitrogen atmosphere. The process also includes forming islands in the polysilicon layer and creating a gate oxide layer, which enhances the performance of the transistor.

Career Highlights

Mahalingam Venkatesan is associated with North American Philips Corporation, where he has contributed to various projects in semiconductor technology. His work has been instrumental in developing efficient manufacturing processes for electronic components. Venkatesan's expertise in thin film transistors has made him a valuable asset to his organization.

Collaborations

Venkatesan has collaborated with Udayanath Mitra, working together on innovative projects that focus on improving semiconductor technologies. Their partnership has led to advancements in the field, showcasing the importance of teamwork in driving innovation.

Conclusion

Mahalingam Venkatesan's contributions to the field of thin film transistors highlight his role as an innovator in semiconductor technology. His patent and collaborative efforts demonstrate the impact of his work on the industry. Venkatesan continues to be a significant figure in advancing electronic manufacturing processes.