Kristiansand, Norway

Magne Mathisen Nordvik

This inventor holds 2 USPTO granted patents, plus 1 CIPO patent and 1 EPO patent. Top assignee: Monolith Materials, Inc.. Active years: 2022-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Magne Mathisen Nordvik. Retrieved from https://idiyas.com/inventor/magne-mathisen-nordvik

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):Explore Patents

Title: Magne Mathisen Nordvik: Innovator in Plasma Torch Technology

Introduction

Magne Mathisen Nordvik is a notable inventor based in Kristiansand, Norway. He has made significant contributions to the field of plasma torch technology, holding two patents that enhance the efficiency and effectiveness of plasma torches in various applications.

Latest Patents

Magne's latest patents focus on design advances for improving the performance of plasma torches. These innovations describe the use of one or more advances that can improve the efficiency and effectiveness of the torch, the reactor, and the manufacturing process. Notably, the patents detail the use of the torch with hydrogen plasma gas, natural gas feedstock, and carbon black production.

Career Highlights

Magne Mathisen Nordvik is currently associated with Monolith Materials, Inc., where he applies his expertise in plasma technology. His work is pivotal in advancing the capabilities of plasma torches, which are essential in various industrial processes.

Collaborations

Magne collaborates with Alexander F. Hoermann, contributing to the development of innovative solutions in their field.

Conclusion

Magne Mathisen Nordvik's contributions to plasma torch technology exemplify his commitment to innovation and efficiency in manufacturing processes. His patents reflect a deep understanding of the complexities involved in plasma technology and its applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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