Lanarkshire, United Kingdom

Magdalena Switnicka-Plak

This inventor holds 1 USPTO granted patent. Top assignee: Ocutec Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Magdalena Switnicka-Plak. Retrieved from https://idiyas.com/inventor/magdalena-switnicka-plak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Magdalena Switnicka-Plak

Introduction

Magdalena Switnicka-Plak is a notable inventor based in Lanarkshire, GB. She has made significant contributions to the field of formulations aimed at reducing or preventing contamination of articles by microorganisms. Her work is characterized by a blend of creativity and scientific rigor.

Latest Patents

Magdalena holds a patent for a formulation that includes at least one block copolymer of ethylene oxide and propylene oxide, at least one polyacrylic acid salt, and at least one propoxylated ethylenediamine compound. This innovative formulation is designed to enhance the safety and longevity of various articles by minimizing microbial contamination.

Career Highlights

Throughout her career, Magdalena has demonstrated a commitment to advancing scientific knowledge and practical applications in her field. She is currently associated with Ocutec Limited, where she continues to develop and refine her innovative ideas.

Collaborations

Magdalena has worked alongside talented individuals such as Roderick Bowers and Neil Bonnette Graham. Their collaborative efforts have contributed to the success of her projects and the advancement of their shared goals.

Conclusion

Magdalena Switnicka-Plak's contributions to the field of formulations are noteworthy and impactful. Her innovative spirit and dedication to her work continue to inspire those around her.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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