This inventor holds 1 USPTO granted patent. Top assignee: The C.p. Hall Company. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Magda M Roth: Innovator in Sunscreen Technology
Introduction
Magda M Roth is a notable inventor based in Homewood, IL (US). He has made significant contributions to the field of sunscreen technology. With a focus on innovative methods and compositions, Roth has developed solutions that enhance the effectiveness of sunscreen products.
Latest Patents
Roth holds 1 patent for his invention titled "Sunscreen compositions and methods and materials for producing the same." This patent describes a method of preparing sunscreen that includes a solvent system and a filter system. The method emphasizes controlling the polarity of the solvent system to manage the rate of photodecay of the filter system. Additionally, it covers various sunscreen compositions and compounds used in the production of these compositions.
Career Highlights
Roth is associated with The C.P. Hall Company, where he applies his expertise in developing innovative sunscreen products. His work has contributed to advancements in the formulation of effective sun protection solutions.
Collaborations
Roth has collaborated with notable colleagues, including Craig Alan Bonda and Urvil B Shah. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the field of sunscreen.
Conclusion
Magda M Roth's contributions to sunscreen technology exemplify the importance of innovation in personal care products. His work not only enhances sun protection but also showcases the potential for advancements in formulation techniques.