Karnataka, India

Madhusudhan H

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Madhusudhan H. Retrieved from https://idiyas.com/inventor/madhusudhan-h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Madhusudhan H: Inventor of a Fatigue-Resistant Load Pin Seal.

Introduction

Madhusudhan H is an inventor based in Karnataka, India, and works at Honeywell International Inc. His patent work addresses sealing and protecting components used in load pins, which can be exposed to demanding operating conditions.

Latest Patents

Madhusudhan H is associated with 1 patent: “Vulcanized Metal Plug for High Fatigue Application for Load Pin.” The invention describes a system for sealing the opening in a load pin that houses a strain gauge. It combines an expansion plug with sealing material vulcanized onto at least part of the plug, helping seal the opening and protect the plug from the external environment. The disclosed method includes selecting and applying suitable sealing material, vulcanizing it to the plug, and inserting the plug into the opening.

Career Highlights

His patent reflects work on improving the durability and environmental protection of load-pin assemblies. By integrating sealing material with an expansion plug, the design aims to provide a reliable seal while accommodating high-fatigue applications.

Collaborations

Madhusudhan H’s listed coworkers include Andrew Kelly and Sudheer Beligere. The patent is associated with Honeywell International Inc.

Conclusion

Madhusudhan H’s invention focuses on a practical sealing solution for load pins, combining a vulcanized metal plug with protective sealing material to support demanding applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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