Los Altos, CA, United States of America

Madeline Payne

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Apple Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Madeline Payne. Retrieved from https://idiyas.com/inventor/madeline-payne-kvccbjhu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Madeline Payne: Innovator in Avatar User Interfaces

Introduction

Madeline Payne is a talented inventor based in Los Altos, California. She has made significant contributions to the field of user interface design, particularly in the realm of avatar customization. Her innovative approach has garnered attention in the tech industry.

Latest Patents

Madeline holds a patent for an "Avatar sticker editor user interfaces." This patent relates to user interfaces designed for editing avatars and avatar stickers. It includes features that allow users to modify colors and other aspects of their avatars, enhancing the overall user experience.

Career Highlights

Madeline is currently employed at Apple Inc., where she continues to develop cutting-edge technologies. Her work focuses on improving user interactions with digital avatars, making them more engaging and customizable.

Collaborations

Madeline collaborates with talented colleagues, including Marco Triverio and Lisa K Forssell. Together, they contribute to innovative projects that push the boundaries of user interface design.

Conclusion

Madeline Payne is a pioneering inventor whose work in avatar user interfaces is shaping the future of digital interaction. Her contributions at Apple Inc. and her innovative patent highlight her role as a leader in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…