This inventor holds 1 USPTO granted patent. Top assignee: Sri International. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Madan Lal Sharma: Innovator in Metal Film Production
Introduction
Madan Lal Sharma is a notable inventor based in Chandigarh, India. He has made significant contributions to the field of materials science, particularly in the production and deposition of metal films. His innovative methods have the potential to enhance the quality and efficiency of metal layer applications in various industries.
Latest Patents
Madan Lal Sharma holds a patent for a method of producing and depositing a metal film. This patent outlines a process that includes several key steps: depositing a metal precursor on a substrate, adding energy to reduce the metal precursor, and precipitating metal on the substrate as a continuous metal layer. The process is designed to ensure that the purity of the continuous metal layer exceeds 85%, and that the deposited layer exhibits electrical conductivity comparable to that of pure metal. Additionally, the patent describes a method for depositing metal onto a substrate in a desired pattern, which involves applying sufficient energy to decompose the precursor and precipitate metal in a continuous layer.
Career Highlights
Madan Lal Sharma is associated with Sri International, where he continues to develop and refine his innovative techniques. His work has garnered attention for its potential applications in various sectors, including electronics and materials engineering.
Collaborations
Madan has collaborated with several professionals in his field, including Sunity Kumar Sharma and Subhash C Narang. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Madan Lal Sharma's contributions to the field of metal film production exemplify the impact of innovative thinking in technology. His patented methods not only enhance the quality of metal layers but also pave the way for future advancements in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
