Kanagawa, Japan

Machiko Suenaga

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Machiko Suenaga: Innovator in Nanoimprint Technology

Introduction

Machiko Suenaga is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of nanoimprint technology, particularly through her innovative patent work. Her expertise and dedication to advancing technology have positioned her as a key figure in her industry.

Latest Patents

Machiko Suenaga holds a patent for a "Patterning method, and template for nanoimprint and producing method thereof." This patent describes a method that includes forming a ground layer on a processing target layer. The ground layer has a higher affinity for one of the segments contained in a self-assembly material than for the other segment. The neutral layer, which is patterned on the ground layer, is neutral to both segments. The method involves irradiating the exposed surfaces of the ground layer and the neutral layer with an energy ray. The self-assembly material is then applied, leading to phase separation into distinct domains. This innovative approach allows for selective removal of one of the domains, showcasing her inventive capabilities.

Career Highlights

Machiko Suenaga is currently employed at Toshiba Memory Corporation, where she continues to push the boundaries of technology. Her work at Toshiba has allowed her to collaborate with other talented professionals in the field, enhancing her contributions to the industry.

Collaborations

Some of her notable coworkers include Hideaki Sakurai and Takeharu Motokawa. Their collaborative efforts have further enriched the innovative environment at Toshiba Memory Corporation.

Conclusion

Machiko Suenaga's contributions to nanoimprint technology through her patent work exemplify her role as an influential inventor. Her dedication to innovation continues to inspire advancements in the field.

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