Helsinki, Finland

Maart Van Druenen

USPTO Granted Patents = 3 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: Maart Van Druenen: Innovator in Advanced Material Deposition

Introduction

Maart Van Druenen is a prominent inventor based in Helsinki, Finland. He has made significant contributions to the field of material science, particularly in the deposition of advanced materials. With a total of 3 patents to his name, his work focuses on innovative methods for forming structures that enhance the performance of electronic devices.

Latest Patents

One of Maart's latest patents is titled "Methods of forming structures including vanadium boride and vanadium phosphide layers." This patent describes methods and systems for depositing a layer of vanadium boride and vanadium phosphide onto a substrate surface. The exemplary method involves a deposition process that includes providing a vanadium precursor and a reactant to the reaction chamber. The resulting structures can be utilized in field effect transistors, including gate-all-around structures. These layers serve various functions, such as barrier layers, work function layers, and dipole shifter layers.

Another notable patent is "Method of forming structures for threshold voltage control." This patent outlines methods for depositing rare earth metal carbide containing layers on a substrate surface. The process employs a cyclical deposition method, such as atomic layer deposition, to create these layers. This innovation is crucial for controlling the threshold voltage in electronic devices.

Career Highlights

Maart Van Druenen is currently associated with ASM IP Holding B.V., where he continues to push the boundaries of material deposition technologies. His expertise in this area has positioned him as a key player in the development of advanced electronic components.

Collaborations

Throughout his career, Maart has collaborated with notable professionals in the field, including Charles Dezelah and Petro Deminskyi. These collaborations have further enriched his research and development efforts, leading to groundbreaking innovations.

Conclusion

Maart Van Druenen's contributions to the field of material science and his innovative patents demonstrate his commitment to advancing technology. His work not only enhances the performance of electronic devices but also paves the way for future innovations in the industry.

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