Hayward, CA, United States of America

Ma Fatimo Seijo


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):

Title: Ma Fatimo Seijo: Innovator in Semiconductor Cleaning Solutions

Introduction

Ma Fatimo Seijo is a prominent inventor based in Hayward, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the development of cleaning compositions that enhance the manufacturing process of semiconductor devices. Her innovative approach addresses critical challenges in the industry.

Latest Patents

Ma Fatimo Seijo holds a patent for an aqueous cleaning composition that contains a copper-specific corrosion inhibitor. This formulation is designed for cleaning inorganic residues on semiconductor substrates. The patent details a semiconductor wafer cleaning formulation that includes 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40% wt. nitrogenous component, such as a nitrogen-containing carboxylic acid or an imine, 20-50% wt. water, and 0-21% wt. metal chelating agent(s). This innovative cleaning solution is particularly useful for removing residues from wafers following a resist plasma ashing step, especially those containing delicate copper interconnecting structures. Ma Fatimo Seijo has 1 patent to her name.

Career Highlights

Ma Fatimo Seijo is associated with Advanced Technology Materials, Inc., where she has been instrumental in advancing semiconductor cleaning technologies. Her work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout her career, Ma Fatimo Seijo has collaborated with notable professionals in her field, including William A Wojtczak and David Daniel Bernhard. These collaborations have fostered innovation and contributed to the development of cutting-edge technologies in semiconductor cleaning.

Conclusion

Ma Fatimo Seijo is a trailblazer in the semiconductor industry, with her innovative cleaning compositions paving the way for improved manufacturing processes. Her contributions continue to influence the field and enhance the performance of semiconductor devices.

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