M Sharon Paras

Title: M Sharon Paras: Innovator in Composite Materials

Introduction

M Sharon Paras is a notable inventor based in Howell, MI (US). He has made significant contributions to the field of materials science, particularly in the development of advanced composite particles. His innovative work has led to the creation of a patented technology that enhances the efficiency of chemical mechanical polishing processes.

Latest Patents

M Sharon Paras holds a patent for "Substantially spherical composite ceria/titania particles." This invention provides a method for forming these particles, which include a crystalline core and an amorphous cladding. The particles are designed to be used as abrasive materials in chemical mechanical polishing compositions, which are essential for removing film layers during the fabrication of integrated circuit devices. His patent is a testament to his expertise in the field, with a total of 1 patent to his name.

Career Highlights

Throughout his career, M Sharon Paras has worked with prominent companies such as Ferro Corporation and Nanocerox, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in material technologies. His work has had a lasting impact on the industry, particularly in the realm of semiconductor manufacturing.

Collaborations

M Sharon Paras has collaborated with esteemed colleagues, including Xiangdong Feng and Yie-Shein Her. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the field of materials science.

Conclusion

M Sharon Paras is a distinguished inventor whose work in composite materials has paved the way for advancements in chemical mechanical polishing processes. His contributions continue to influence the industry and inspire future innovations.