Pittsburgh, PA, United States of America

M Luigi Colaianni


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: **M Luigi Colaianni: Innovator in Silicon Etching Technology**

Introduction

M Luigi Colaianni is an accomplished inventor based in Pittsburgh, PA, known for his significant contributions to semiconductor processing technologies. His innovative work has led to advancements in the field of silicon etching, which plays a crucial role in the fabrication of electronic devices.

Latest Patents

Colaianni holds a patent for a unique process titled "Process for controlling silicon etching by atomic hydrogen." This patent outlines a method for spatially controlling the etching of a silicon substrate using atomic hydrogen, with the notable advantage of being effective at room temperature. The process involves implanting a boron dopant in selected areas of the silicon substrate, allowing for precise etching control. Remarkably, the implanted sections demonstrate no etching when treated with atomic hydrogen, enhancing the reliability of silicon devices produced through this innovative technique.

Career Highlights

M Luigi Colaianni is affiliated with the University of Pittsburgh, where he continues to expand his research and innovation efforts. Throughout his career, he has played a pivotal role in advancing semiconductor technologies, focusing on improving the efficiency and effectiveness of manufacturing processes in the industry.

Collaborations

Colaianni has collaborated with esteemed colleagues such as John T Yates, Jr and Peijun J Chen. Together, they have contributed to the development of new techniques and methodologies that advance the field of semiconductor engineering, fostering a spirit of innovation and teamwork.

Conclusion

M Luigi Colaianni stands out as a remarkable inventor whose work has significantly influenced the way silicon devices are manufactured. His pioneering patent for controlling silicon etching by atomic hydrogen represents a notable achievement in the field, showcasing his commitment to innovation and excellence in engineering. As he continues to collaborate with fellow researchers, his contributions will undoubtedly shape the future of semiconductor technology.

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