Madison, WI, United States of America

M Isabel Tejedor

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Wisconsin Alumni Research Foundation. Active years: 2015-2018.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2015-2018

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2 patents (USPTO):Explore Patents

Title: M Isabel Tejedor: Innovator in Metal Substrates

Introduction

M Isabel Tejedor is a prominent inventor based in Madison, WI (US). She has made significant contributions to the field of materials science, particularly in the development of metal substrates. With a total of 2 patents, her work focuses on enhancing the performance and durability of metal-containing apparatuses.

Latest Patents

Tejedor's latest patents include innovations related to metal substrates that incorporate metal oxide nanoporous thin films. These patents describe a metal-containing apparatus designed to be highly resistant to pitting corrosion and wear in aggressive media. An exemplary application of her work is in plate heat exchangers, where the metal features an oxidation layer on its surface, topped with a thin metal oxide nanoporous film. This nanoporous film is highly compliant and consists of oxygen along with elements such as aluminum, titanium, silicon, and zirconium.

Career Highlights

Tejedor is affiliated with the Wisconsin Alumni Research Foundation, where she continues to advance her research and development efforts. Her innovative approaches have positioned her as a key figure in her field, contributing to the advancement of technology in metal substrates.

Collaborations

Some of her notable coworkers include Marc A Anderson and Ole Christensen, who collaborate with her on various projects and research initiatives.

Conclusion

M Isabel Tejedor's contributions to the field of metal substrates and her innovative patents highlight her role as a leading inventor. Her work not only enhances the durability of metal apparatuses but also paves the way for future advancements in materials science.

Profile summary based on public USPTO records.
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