This inventor holds 1 USPTO granted patent. Top assignee: Massachusetts Institute of Technology. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Lynne M Svedberg: Innovator in Selective Substrate Metallization
Introduction
Lynne M Svedberg is a prominent inventor based in Austin, TX (US). She has made significant contributions to the field of materials science, particularly in the area of selective substrate metallization. Her innovative work has led to the development of a unique process that enhances the efficiency of electroless plating.
Latest Patents
Lynne M Svedberg holds 1 patent for her invention titled "Selective Substrate Metallization." This patent describes a process for selective electroless plating onto a substrate. The process involves providing a substrate with at least a catalytic surface and a plating gel that includes a carrier vehicle, an electroless platable metal compound, a reducing agent, and a polymeric thickening agent. The plating gel is applied to the substrate surface in a selected pattern, inducing the plating of metal on the substrate surface in that pattern. The invention may also include various additives such as stabilizers, buffering agents, and surfactants, with a preference for using a gold complex as the metal compound on aluminum nitride substrates.
Career Highlights
Lynne M Svedberg has established herself as a key figure in her field through her innovative research and development efforts. Her work at the Massachusetts Institute of Technology has positioned her at the forefront of advancements in substrate metallization techniques.
Collaborations
Throughout her career, Lynne has collaborated with notable colleagues, including Kenneth C Arndt and Michael John Cima. These collaborations have further enriched her research and contributed to the success of her projects.
Conclusion
Lynne M Svedberg's contributions to selective substrate metallization exemplify her innovative spirit and dedication to advancing technology in materials science. Her work continues to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
