Lynn Tao-Ning Wang

Title: Innovations by Lynn Tao-Ning Wang

Introduction

Lynn Tao-Ning Wang is a notable inventor based in Fremont, California. He has made significant contributions to the field of integrated circuit (IC) design. His innovative work focuses on optimizing mask allocation in IC layout post-decomposition.

Latest Patents

Lynn holds a patent for "IC layout post-decomposition mask allocation optimization." This patent describes a method where an IC design layout is decomposed into multiple masks to produce an initial output. A post-decomposition optimization is performed, which includes identifying hotspots in the multiple masks. The process involves clustering features that contribute to the hotspots into clusters and identifying which clusters can be relocated to a different mask to eliminate the hotspot without violating design rules. These clusters are ranked based on manufacturability metrics, and the reversible clusters are moved to different masks according to the established priority. This results in a post-decomposition optimized tape-out, which is then applied to manufacturing equipment for IC device production.

Career Highlights

Lynn is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company has been instrumental in advancing IC design methodologies. He collaborates with talented professionals in the field, including his coworker Sriram Madhavan.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Lynn Tao-Ning Wang's innovative contributions to IC design optimization demonstrate his expertise and commitment to advancing technology in the semiconductor industry. His patent reflects a significant step forward in improving manufacturing processes for integrated circuits.