Company Filing History:
Years Active: 1989-1990
Title: Lydia L Rivaud: Innovator in Microelectronics
Introduction
Lydia L Rivaud is a prominent inventor based in Rochester, NY (US). She has made significant contributions to the field of microelectronics, particularly in the development of advanced semiconductor technologies. With a total of 2 patents to her name, Rivaud has demonstrated her expertise and innovative spirit in her work.
Latest Patents
Rivaud's latest patents include a method for creating an etch-resistant oxide mask formed by low temperature and low energy. This innovative process involves implanting oxygen ions into silicon to form oxide masks. Additionally, she has developed a process to eliminate the re-entrant profile in double polysilicon gate structures. This process is crucial for VLSI microelectronic devices, such as CCDs, and involves several steps, including the deposition of a conformal insulating layer and plasma etching.
Career Highlights
Lydia L Rivaud is currently employed at Eastman Kodak Company, where she continues to push the boundaries of technology in her field. Her work has been instrumental in advancing microelectronic device fabrication techniques, making her a valuable asset to her organization.
Collaborations
Throughout her career, Rivaud has collaborated with notable colleagues, including Gilbert Allan Hawkins and Paul L Roselle. These partnerships have further enriched her work and contributed to the success of her innovative projects.
Conclusion
Lydia L Rivaud stands out as a key figure in the realm of microelectronics, with her patents reflecting her commitment to innovation and excellence. Her contributions continue to shape the future of semiconductor technology.