Kriens, Switzerland

Luzius Berger


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Kriens, CH (1997 - 2000)
  • Malters, CH (2001)

Company Filing History:


Years Active: 1997-2001

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4 patents (USPTO):Explore Patents

Title: Luzius Berger: Innovator in Industrial Yarn Technology

Introduction

Luzius Berger is a notable inventor based in Kriens, Switzerland. He has made significant contributions to the field of industrial yarn technology, holding a total of 4 patents. His innovative approaches have led to advancements in the production and application of polyamide yarns.

Latest Patents

One of Luzius Berger's latest patents is for an industrial yarn made from PA 6.6 with minimal cotton waste. This yarn is characterized by filaments with a global yarn count ranging from 900 to 2100 tex. The production process involves submitting wet granulate PA 6.6 to a melt spinning-drawing process, resulting in a yarn with a strength exceeding 84 cN/tex and less than 1.5 linters per kilometer. This yarn is particularly suited for the production of cord fabric with a rubber ply. Another significant patent focuses on a process for producing high-strength, high-shrinkage polyamide 66, further showcasing his expertise in this domain.

Career Highlights

Throughout his career, Luzius Berger has worked with several prominent companies, including Rhodia Filtec AG and Hone Poulenc Viscosuisse SA. His experience in these organizations has allowed him to refine his skills and contribute to the development of innovative yarn technologies.

Collaborations

Luzius has collaborated with notable professionals in his field, including Klaus Fischer and Hans Stehr. These partnerships have facilitated the exchange of ideas and have been instrumental in advancing his projects.

Conclusion

Luzius Berger's contributions to industrial yarn technology reflect his dedication to innovation and excellence. His patents and career achievements underscore his role as a leading inventor in the field.

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