Dresden, Germany

Lutz Herrmann


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2004-2007

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Lutz Herrmann: Innovator in Circuit Element Control

Introduction

Lutz Herrmann is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of circuit elements, particularly in the area of product parameter control during fabrication processes. With a total of 4 patents to his name, Herrmann's work has had a substantial impact on the technology industry.

Latest Patents

Herrmann's latest patents include a "Method and system for controlling a product parameter of a circuit element." This innovation allows for the adjustment of product parameters, such as operating speed, of circuit elements like field effect transistors during their fabrication. The method involves a superior control scheme that responds to measurement data from various processes, ensuring optimal performance. Another significant patent is the "Method of forming a low leakage dielectric layer providing an increased capacitive coupling." This method focuses on creating a dielectric layer that enhances capacitive coupling while maintaining low leakage current levels, achieved through the introduction of dopants and precise manufacturing techniques.

Career Highlights

Lutz Herrmann is currently employed at Advanced Micro Devices Corporation, where he continues to develop innovative solutions in semiconductor technology. His expertise in controlling product parameters has positioned him as a key player in the industry.

Collaborations

Some of Herrmann's notable coworkers include Karsten Wieczorek and Falk Graetsch, who contribute to the collaborative environment at Advanced Micro Devices Corporation.

Conclusion

Lutz Herrmann's contributions to circuit element technology through his patents and work at Advanced Micro Devices Corporation highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…