Company Filing History:
Years Active: 2022-2024
Title: **Innovations of Luping Li: Advancements in Atomic Layer Deposition**
Introduction
Luping Li, an accomplished inventor based in Tempe, Arizona, has made significant contributions to the field of material science with a focus on atomic layer deposition techniques. With two patents to his name, Li's innovative work seeks to enhance the efficiency and effectiveness of transitioning metal nitride films on various substrates.
Latest Patents
Luping Li's latest patents revolve around the methods and apparatus involved in depositing transition metal nitride films through atomic layer deposition. His innovative approach outlines an apparatus that includes a substrate support designed to hold at least one substrate within a reaction space. This system features a temperature control system that meticulously regulates the temperature of chamber walls and showerheads, optimizing the deposition environment. The apparatus allows for the sequential feeding of vapor phase reactants while maintaining precise temperature conditions ranging from approximately 80°C to 160°C. These advancements are crucial for improving deposition quality and efficiency, marking a significant step forward in material fabrication processes.
Career Highlights
Li serves as a pivotal figure at ASM IP Holding B.V., where his technical expertise and innovative mindset contribute to the company's progression in advanced manufacturing technologies. His work has helped the company solidify its status as a leader in the development of atomic layer deposition equipment.
Collaborations
In his professional journey, Luping Li has collaborated with notable colleagues, including Eric James Shero and Robert Brennan Milligan. Together, they have worked on various projects that emphasize the importance of teamwork and shared knowledge in driving innovation within the field.
Conclusion
Luping Li's patents and work at ASM IP Holding B.V. underscore his significance as an inventor in the realm of material science and atomic layer deposition. His contributions not only advance technological processes but also pave the way for future innovations in the industry. Through continuous collaboration and a commitment to excellence, Li's future endeavors are sure to leave a lasting impact on the field.