Iruma, Japan

Lung Kei Amos Shek


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021-2022

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3 patents (USPTO):Explore Patents

Title: Lung Kei Amos Shek: Innovator in Plasma Treatment Technology

Introduction

Lung Kei Amos Shek is a notable inventor based in Iruma, Japan. He has made significant contributions to the field of plasma treatment technology, holding a total of 3 patents. His work focuses on improving the uniformity of film formation through innovative plasma treatment devices.

Latest Patents

Among his latest patents is a plasma treatment device and structure of a reaction vessel for plasma treatment. This invention enhances the in-plane uniformity of films formed via plasma treatment. The device is designed to introduce process gas between an electrode plate and a shower plate, which is then exhausted toward a counter electrode through multiple small holes in the shower plate. The inclusion of a diffuser plate with small holes arranged parallel to the shower plate allows for improved gas flow and uniformity in film formation. Another patent details a plasma treatment device that includes an electrode plate and a counter electrode arranged in a reaction vessel, along with a transmission plate for supplying frequency power. This design optimizes the contact between the electrode plate and the insulator, further enhancing the efficiency of the plasma treatment process.

Career Highlights

Lung Kei Amos Shek has worked with several companies throughout his career, including Core Technology, Inc. and Askagi Corporation. His experience in these organizations has contributed to his expertise in plasma treatment technologies and innovations.

Collaborations

He has collaborated with notable coworkers such as Toshiaki Yoshimura and Hiroyuki Minowa, further enriching his professional journey and contributions to the field.

Conclusion

Lung Kei Amos Shek is a distinguished inventor whose work in plasma treatment technology has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to enhancing film formation processes through plasma treatment.

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