Lung-Chieh Cheng

Title: Lung-Chieh Cheng: Innovator in Gallium Nitride Technology

Introduction

Lung-Chieh Cheng is a prominent inventor based in Jung-Li, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of gallium nitride (GaN) materials. His innovative approaches have the potential to enhance the performance and manufacturing efficiency of optoelectronic devices.

Latest Patents

Lung-Chieh Cheng holds a patent for a "Growth method for reducing defect density of gallium nitride." This method involves several steps, including the sequential formation of a buffer growth layer, a stress release layer, and a first nanometer cover layer on a substrate. The first nanometer cover layer features multiple openings interconnected with the stress release layer. The process continues with the growth of a first island in each opening, followed by the application of a first buffer layer and a second nanometer cover layer on the first island. Finally, a second island is grown to create a dislocated island structure. This innovative method allows for the direct formation of multiple dislocated island structures, which reduces manufacturing complexity and increases yield rates by minimizing variations in the manufacturing environment. Additionally, the epitaxial lateral overgrowth (ELOG) approach significantly enhances the characteristics of GaN optoelectronic semiconductor elements.

Career Highlights

Lung-Chieh Cheng is currently associated with Tekcore Co., Ltd., where he continues to push the boundaries of semiconductor research and development. His work has been instrumental in advancing the understanding and application of gallium nitride technology.

Collaborations

Throughout his career, Lung-Chieh Cheng has collaborated with notable colleagues, including Jen-Inn Chyi and Hsueh-Hsing Liu. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects in the semiconductor field.

Conclusion

Lung-Chieh Cheng's contributions to gallium nitride technology exemplify the impact of innovative thinking in the semiconductor industry. His patented growth method not only simplifies manufacturing processes but also enhances the performance of optoelectronic devices. His work continues to inspire advancements in this critical field.