Lun-Wen Yeh

Title: Innovations of Lun-Wen Yeh in Integrated Circuit Design

Introduction

Lun-Wen Yeh is a prominent inventor based in Ji-an Township, Taiwan. He has made significant contributions to the field of integrated circuit design, holding a total of 4 patents. His work focuses on enhancing the efficiency and precision of lithography processes used in semiconductor manufacturing.

Latest Patents

One of Lun-Wen Yeh's latest patents is titled "Method and apparatus for integrated circuit mask patterning." This patent discloses various integrated circuit (IC) design methods. An exemplary method involves receiving an IC design layout that includes an IC feature to be formed on a wafer using a lithography process. The method includes inserting a spacing in the IC feature, which generates a modified IC design layout that divides the IC feature into a first main feature and a second main feature separated by the spacing. The spacing has a sub-resolution dimension, ensuring that the IC feature does not include the spacing when formed on the wafer. A mask can be fabricated based on this modified IC design layout, allowing for a lithography process to be performed using the mask to form the IC feature on a wafer.

Career Highlights

Lun-Wen Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches to IC design have positioned him as a key player in advancing semiconductor technology.

Collaborations

Lun-Wen Yeh has collaborated with notable colleagues, including Chin-Min Huang and Bo-Han Chen, who contribute to the dynamic environment of innovation within their team.

Conclusion

Lun-Wen Yeh's contributions to integrated circuit design exemplify the importance of innovation in the semiconductor industry. His patents reflect a commitment to improving lithography processes, which are crucial for the advancement of technology.