Lukasz Urbanski

Title: Innovations of Lukasz Urbanski in Nanopatterning Technology

Introduction

Lukasz Urbanski is a notable inventor based in Fort Collins, CO (US). He has made significant contributions to the field of nanopatterning technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

His latest patents focus on "Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified Talbot effect." This invention describes an apparatus and method for nanopatterning substrates, which includes several key features. Firstly, it allows for the rapid printing of large arrays of nanostructures. Secondly, the use of short extreme ultraviolet wavelengths enables sub-100 nm spatial resolution. Additionally, the de-magnification factor can be continuously adjusted, providing flexibility in the scaling process. The patterning technique relies on the collective diffraction of numerous tiled units, which enhances error resistance by averaging defects over the mask area. Importantly, the Talbot mask remains durable since the method is non-contact, and the feature sizes on the mask do not need to match the desired sizes on the target.

Career Highlights

Lukasz Urbanski has worked with reputable organizations, including the Colorado State University Research Foundation and Synopsys, Inc. His experience in these institutions has contributed to his expertise in the field of nanopatterning.

Collaborations

He has collaborated with notable colleagues such as Mario C. Marconi and Jorge J. Rocca, further enhancing his work in innovative technologies.

Conclusion

Lukasz Urbanski's contributions to nanopatterning technology through his patents and collaborations highlight his role as a significant inventor in this field. His work continues to influence advancements in nanotechnology and related applications.