This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Inphotech Spolka Z Ograniczona Odpowiedzialnoscia. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Innovations of Lukasz Szostkiewcz in Optical Fibre Measurement
Introduction
Lukasz Szostkiewcz is an accomplished inventor based in Torun, Poland. He has made significant contributions to the field of optical fibre technology, particularly in measurement methods. His innovative approach has led to the development of a unique patent that addresses the measurement of environmental parameters using optical fibres.
Latest Patents
Lukasz Szostkiewcz holds a patent for an "Optical fibre based measurement method of measuring parameters, and computer program product." This invention includes an optical fibre based measurement system that features a system for generating radiation with a monotonically tuneable wavelength during sweep periods. The system comprises an optical path that includes an interferometer and a measuring optical fibre sensitive to at least two environmental parameters. The measurement system is equipped with a processing unit that generates control signals for the radiation system, enhancing the accuracy and efficiency of measurements.
Career Highlights
Lukasz Szostkiewcz is currently employed at Inphotech Spolka Z Ograniczona Odpowiedzialnoscia, where he continues to innovate in the field of optical measurements. His work has been instrumental in advancing the capabilities of measurement systems, making them more reliable and effective in various applications.
Collaborations
Lukasz has collaborated with notable colleagues such as Krzystof Markiewicz and Jakub Kaczorowski. Their combined expertise has contributed to the successful development of innovative solutions in optical fibre technology.
Conclusion
Lukasz Szostkiewcz's contributions to optical fibre measurement technology exemplify the impact of innovation in scientific research and practical applications. His patent and ongoing work at Inphotech highlight the importance of collaboration and creativity in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile