Wrocław, Poland

Lukasz John

This inventor holds 1 USPTO granted patent. Top assignee: Uniwersytet Wroclawski. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lukasz John. Retrieved from https://idiyas.com/inventor/lukasz-john

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Lukasz John

Introduction

Lukasz John is a notable inventor based in Wroclaw, Poland. He has made significant contributions to the field of materials science, particularly through his innovative patent related to polyhedral oligomeric silsesquioxanes (POSS). His work exemplifies the intersection of chemistry and engineering, showcasing the potential for advancements in this area.

Latest Patents

Lukasz John holds a patent for a method of converting polyhedral oligomeric silsesquioxane (POSS) type T8 into type 10. This conversion method involves treating octasilsesquioxane with at least a ten-fold excess of organic acid, resulting in the formation of decasilsesquioxane. The reaction is conducted in air, highlighting the practical applications of his research in material transformations.

Career Highlights

Lukasz John is affiliated with the University of Wroclaw, where he continues to engage in research and development. His academic background and ongoing projects contribute to the advancement of knowledge in his field. His dedication to innovation is evident in his patent and the potential applications of his work.

Collaborations

Lukasz collaborates with esteemed colleagues such as Slawomir Szafert and Mateusz Przemyslaw Janeta. These partnerships enhance the research environment and foster the exchange of ideas, further driving innovation in their respective fields.

Conclusion

Lukasz John's contributions to the field of materials science through his innovative patent demonstrate his commitment to advancing technology. His work not only reflects his expertise but also paves the way for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…