Schoenenbuch, Switzerland

Lukas Gampp

This inventor holds 1 USPTO granted patent. Top assignee: Accelleron Switzerland Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lukas Gampp. Retrieved from https://idiyas.com/inventor/lukas-gampp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Lukas Gampp

Introduction

Lukas Gampp is an innovative inventor based in Schoenenbuch, Switzerland. He has made significant contributions to the field of additive manufacturing, particularly in the area of turbomachinery components. His work focuses on enhancing manufacturing processes and improving efficiency.

Latest Patents

Lukas Gampp holds a patent for a method titled "Method for removal of support structures of additive manufactured components by pressurized jet." This patent describes a process for manufacturing a vaned component of a turbomachine. The method involves providing a base portion, additively manufacturing a plurality of vanes and support structures on top of it, and applying a pressurized jet to remove the support structures effectively. He has 1 patent to his name.

Career Highlights

Lukas is currently employed at Accelleron Switzerland Ltd., where he continues to develop innovative solutions in additive manufacturing. His expertise in this field has positioned him as a valuable asset to his company and the industry.

Collaborations

Lukas has collaborated with notable colleagues, including Timo Schudeleit and Egon Seegers. Their teamwork has contributed to advancements in their projects and has fostered a collaborative environment for innovation.

Conclusion

Lukas Gampp's contributions to additive manufacturing and his innovative patent demonstrate his commitment to advancing technology in turbomachinery. His work continues to inspire and influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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