Livermore, CA, United States of America

Luis J Bernardez



Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2002-2004

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2 patents (USPTO):Explore Patents

Title: Innovations of Luis J Bernardez

Introduction

Luis J Bernardez is an accomplished inventor based in Livermore, CA (US). He holds 2 patents that showcase his expertise in the field of radiation exposure and lithography technologies. His innovative contributions have significantly impacted the industry.

Latest Patents

One of his latest patents is the "In-vacuum exposure shutter." This device regulates a large footprint light beam and includes a source of radiation that generates an energy beam. The shutter consists of a frame defining an aperture and a plurality of blades secured to the frame. The device rotates the shutter to allow the energy beam to travel through the aperture or to be intercepted by the blades. This shutter device is particularly suited for operation in a vacuum environment and can achieve shuttering speeds from about 0.1 second to 0.001 second or faster.

Another notable patent is the "Diffraction spectral filter for use in extreme-UV lithography condenser." This condenser system generates a beam of radiation and includes a source of radiation light that produces a continuous spectrum of radiation light. The system features a condenser with optical elements for collecting radiation and a diffractive spectral filter for separating radiation light of a particular wavelength. Cooling devices can be employed to remove heat generated, making this system suitable for use with a ringfield camera in projection lithography.

Career Highlights

Luis has worked with several companies, including EUV LLC and EUV Limited Liability Corporation. His work has been instrumental in advancing technologies related to radiation exposure and lithography.

Collaborations

Luis has collaborated with notable individuals in his field, including William C Sweatt and Daniel A Tichenor. Their combined expertise has contributed to the success of various projects.

Conclusion

Luis J Bernardez is a prominent inventor whose work in radiation exposure and lithography has led to significant advancements in technology. His patents reflect his innovative spirit and dedication to improving industry standards.

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