Philadelphia, PA, United States of America

Luis Cielak

This inventor holds 1 USPTO granted patent. Top assignee: Near-Miss Management LLC. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations by Luis Cielak in Risk Management

Introduction

Luis Cielak is an accomplished inventor based in Philadelphia, PA (US). He has made significant contributions to the field of risk management, particularly in manufacturing operations. His innovative approach focuses on enhancing safety and operational efficiency through advanced predictive analytics.

Latest Patents

Cielak holds a patent for the invention titled "Dynamic prediction of risk levels for manufacturing operations through leading risk indicators: dynamic risk analyzer engine." This dynamic risk analyzer (DRA) periodically assesses real-time or historic process data associated with manufacturing facilities. The DRA identifies hidden near-misses in operations, even when process data appears normal. By providing a comprehensive understanding of risk status, the DRA enables management and operating personnel to take strategic actions to reduce or avert adverse incidents or catastrophic failures.

Career Highlights

Luis Cielak is currently employed at Near-Miss Management LLC, where he applies his expertise in risk analysis to improve safety protocols in manufacturing environments. His work is instrumental in developing systems that enhance operational reliability and safety.

Collaborations

Cielak collaborates with talented professionals such as Ankur Pariyani and Dmitriy Bespalov, contributing to innovative solutions in risk management.

Conclusion

Luis Cielak's contributions to the field of risk management through his innovative patent demonstrate his commitment to improving safety in manufacturing operations. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
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