Company Filing History:
Years Active: 1982-1999
Title: Ludwig Stein: Innovator in Chemical Metallization
Introduction
Ludwig Stein is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of chemical metallization, particularly through his innovative processes involving palladium layers and synthetic materials. With a total of 4 patents, Stein's work has advanced the methods used in various industrial applications.
Latest Patents
One of Stein's latest patents is a palladium layers deposition process. This invention involves a formaldehyde-free chemical bath containing a palladium salt, a nitrogenated completing agent, and formic acid or its derivatives, at a pH greater than 4. The process allows for the deposition of an adhesive, permanently glossy, bright palladium layer on a metal surface, which may include copper, nickel, cobalt, and their alloys. Additionally, he has developed a process for the pre-treatment of synthetic materials, particularly polyetherimide, polycarbonate, and poly(ester-co-carbonate). This process involves treating the synthetic material with a quaternary base dissolved in an organic solvent, preparing it for adhesive chemical metallization.
Career Highlights
Throughout his career, Ludwig Stein has worked with prominent companies such as Schering Aktiengesellschaft and Atotech Deutschland GmbH. His experience in these organizations has contributed to his expertise in chemical processes and metallization techniques.
Collaborations
Stein has collaborated with notable colleagues, including Hartmut Mahlkow and Waltraud Strache. These partnerships have likely enriched his work and led to further advancements in his field.
Conclusion
Ludwig Stein's innovative contributions to chemical metallization and his successful patent portfolio highlight his role as a significant inventor in the industry. His work continues to influence the development of advanced metallization processes.