Reut, Germany

Ludwig Pichlmeier

This inventor holds 1 USPTO granted patent. Top assignee: Wacker Siltronic Gesellschaft Fur Halbleitermaterialien. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ludwig Pichlmeier. Retrieved from https://idiyas.com/inventor/ludwig-pichlmeier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Ludwig Pichlmeier: Innovator in Workpiece Treatment Technology

Introduction

Ludwig Pichlmeier is a notable inventor based in Reut, Germany. He has made significant contributions to the field of workpiece treatment technology. His innovative approach has led to the development of a unique process that enhances the treatment of disk-shaped workpieces.

Latest Patents

Ludwig Pichlmeier holds 1 patent for his invention titled "Process for treating disk-shaped workpieces with a liquid." This process involves treating disk-shaped workpieces in a gas-tight chamber. The workpieces, stacked in a transport rack, come into contact with a fed-in liquid. The liquid is then conducted away from the chamber, while noxious vapors or gases originating from the liquid are scrubbed out and removed in a dissolved condition.

Career Highlights

Ludwig Pichlmeier is associated with Wacker Siltronic Gesellschaft für Halbleitermaterialien, where he has been instrumental in advancing semiconductor materials. His work has contributed to the efficiency and effectiveness of workpiece treatment processes in the semiconductor industry.

Collaborations

Some of his notable coworkers include Rudolf Wengbauer and Bernd Passer. Their collaboration has fostered an environment of innovation and excellence in their field.

Conclusion

Ludwig Pichlmeier's contributions to workpiece treatment technology exemplify the spirit of innovation. His patented process showcases his commitment to improving industrial practices. His work continues to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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