Kessel, Belgium

Ludovicus H Vefvloet

This inventor holds 1 USPTO granted patent. Top assignee: Agfa Gevaert Nv. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ludovicus H Vefvloet. Retrieved from https://idiyas.com/inventor/ludovicus-h-vefvloet

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1993

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ludovicus H Vefvloet: Innovator in Lithographic Printing Technology

Introduction

Ludovicus H Vefvloet is a notable inventor based in Kessel, Belgium. He has made significant contributions to the field of lithographic printing technology. His innovative approach has led to the development of a unique method for creating lithographic aluminium offset printing plates.

Latest Patents

Ludovicus holds 1 patent for his invention titled "Method for making a lithographic aluminium offset printing plate." This patent outlines a comprehensive process that enhances the efficiency and quality of printing plates used in the offset printing industry.

Career Highlights

Ludovicus is associated with Agfa Gevaert NV, a leading company in imaging technology and printing solutions. His work at Agfa Gevaert has allowed him to focus on advancing printing technologies and improving production methods.

Collaborations

Throughout his career, Ludovicus has collaborated with esteemed colleagues such as Paul J Coppens and Eric M Hoes. These partnerships have fostered innovation and contributed to the development of new technologies in the printing sector.

Conclusion

Ludovicus H Vefvloet's contributions to lithographic printing technology exemplify the impact of innovation in the industry. His patent and work at Agfa Gevaert NV highlight his commitment to advancing printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…