Munich, Germany

Ludger Urban

This inventor holds 1 USPTO granted patent. Top assignee: Bühler Alzenau Gmbh. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Ludger Urban: Innovator in Vacuum Coating Technology

Introduction

Ludger Urban is a notable inventor based in Munich, Germany. He has made significant contributions to the field of vacuum coating technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of vacuum treatment processes.

Latest Patents

Ludger Urban holds a patent for a "Device and method for vacuum coating." This invention involves an apparatus designed for the vacuum treatment of substrates within a vacuum chamber. The apparatus features a substrate support device with a pylon that can rotate about a longitudinal axis. It includes holding means for substrates and a plasma discharge device associated with the pylon. The plasma discharge device consists of multiple plate-shaped electrodes with excitation areas oriented towards the pylon. A power supply device is also included to excite the plasma discharge, which acts on both the pylon and the substrates arranged on it. This innovative process effectively performs vacuum coating using the described apparatus.

Career Highlights

Ludger Urban is currently employed at Bühler Alzenau GmbH, where he continues to advance his research and development efforts in vacuum coating technology. His work has positioned him as a key figure in this specialized field.

Collaborations

Ludger collaborates with esteemed colleagues such as Torsten Schmauder and Wilfried Dicken. Their combined expertise contributes to the innovative projects at Bühler Alzenau GmbH.

Conclusion

Ludger Urban's contributions to vacuum coating technology exemplify his commitment to innovation and excellence. His patent and ongoing work at Bühler Alzenau GmbH highlight his role as a leading inventor in this field.

Profile summary based on public USPTO records.
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