Gieres, France

Lucienne Ravaine

This inventor holds 1 USPTO granted patent. Top assignee: Centre National De La Recherche Scientifique. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Lucienne Ravaine: Innovator in Silica Derivatives

Introduction

Lucienne Ravaine is a prominent inventor based in Gieres, France. She has made significant contributions to the field of materials science, particularly in the development of compositions based on derivatives of silica modified by organic groups. Her innovative work has led to the granting of a patent, showcasing her expertise and dedication to advancing technology.

Latest Patents

Lucienne holds a patent for her invention titled "Compositions based on derivatives of silica modified by organic groups." This patent represents her unique approach to enhancing the properties of silica, which has various applications in different industries. She has 1 patent to her name, reflecting her impactful contributions to the field.

Career Highlights

Lucienne Ravaine is affiliated with the Centre National de la Recherche Scientifique, a prestigious research institution in France. Her role at this institution has allowed her to engage in cutting-edge research and collaborate with other experts in her field. Her work has not only advanced scientific knowledge but has also paved the way for practical applications of her inventions.

Collaborations

Throughout her career, Lucienne has worked alongside notable colleagues, including Michel B. Armand and Yves Charbouillot. These collaborations have enriched her research and contributed to the success of her projects.

Conclusion

Lucienne Ravaine is a remarkable inventor whose work in silica derivatives has made a significant impact in materials science. Her dedication to innovation and collaboration continues to inspire future advancements in the field.

Profile summary based on public USPTO records.
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